/* Light.*.Alpha is not used. */
struct ureg_dst rD = ureg_writemask(ureg_DECL_temporary(ureg), TGSI_WRITEMASK_XYZ);
struct ureg_dst rA = ureg_writemask(ureg_DECL_temporary(ureg), TGSI_WRITEMASK_XYZ);
- struct ureg_dst rS = ureg_writemask(ureg_DECL_temporary(ureg), TGSI_WRITEMASK_XYZ);
+ struct ureg_dst rS = ureg_DECL_temporary(ureg);
struct ureg_src mtlP = _XXXX(MATERIAL_CONST(4));
/* Set alpha factors of illumination to 1.0 for the multiplications. */
rD.WriteMask = TGSI_WRITEMASK_W; rD.Saturate = 0;
- rS.WriteMask = TGSI_WRITEMASK_W; rS.Saturate = 0;
rA.WriteMask = TGSI_WRITEMASK_W; rA.Saturate = 0;
ureg_MOV(ureg, rD, ureg_imm1f(ureg, 1.0f));
- ureg_MOV(ureg, rS, ureg_imm1f(ureg, 1.0f));
/* Apply to material:
*
ureg_ADD(ureg, ureg_writemask(oCol[0], TGSI_WRITEMASK_W), vs->mtlD, _W(tmp));
ureg_release_temporary(ureg, tmp);
}
- ureg_MUL(ureg, oCol[1], ureg_imm4f(ureg, 0.0f, 0.0f, 0.0f, 1.0f), vs->mtlS);
+ ureg_MOV(ureg, oCol[1], ureg_imm1f(ureg, 0.0f));
} else {
ureg_MOV(ureg, oCol[0], vs->aCol[0]);
ureg_MOV(ureg, oCol[1], vs->aCol[1]);